PVD is the abbreviation for “ Physical Vapor Deposition” . The process takes
place inside a vacuum chamber where plasma vapor consisting of reactive gases of Nitrogen and Argon combine with ceramic materials and condense onto the substrates. These dense, yet thin ceramic layers are 1 to 4 hundredths of a millimeter thick and have a high hardness, high resistance to abrasion and chemical attack. It also makes for a very evenly coated, smooth, bright and shiny surface.